Professor BLU, Thierry is awarded the Outstanding Fellow of the Faculty of Engineering

Prof. BLU, Thierry from the Department of Electronic Engineering, The Chinese University of Hong Kong (CUHK), is awarded the Outstanding Fellow of the Faculty of Engineering. For details on his research interests and achievements, please visit http://www.ee.cuhk.edu.hk/~tblu

Prof. K.K. Cheng Michael has been awarded the Vice-Chancellor’s Exemplary Teaching Award 2017.

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Congratulations!

Professor Hon Ki TSANG named 2019 IEEE Fellow

Prof. Hon Ki TSANG, from The Chinese University of Hong Kong, Hong Kong, has been named an IEEE Fellow. He is being recognized for “Contributions to Nonlinear silicon photonics and Advanced Waveguide Grating Couplers”. Prof Tsang has made fundamental contributions to advance the scientific understanding and the technology of silicon photonics. Silicon photonics is emerging as the main technology platform for high capacity optical interconnects in Data Centers, and enables the continued growth of internet data traffic in the era of Big Data, and the rise of the global internet economy.

The IEEE Grade of Fellow is conferred by the IEEE Board of Directors upon a person with an outstanding record of accomplishments in any of the IEEE fields of interest. The total number selected in any one year cannot exceed one-tenth of one- percent of the total voting membership. IEEE Fellow is the highest grade of membership and is recognized by the technical community as a prestigious honor and an important career achievement.

Professor Hon Ki Tsang is recognized for his pioneering scientific contributions in the field of nonlinear silicon photonics. In 2000-2005 he carried out the first experimental investigations of nonlinear optical effects in silicon optical waveguides and published some of the first scientific papers describing two photon absorption, free carrier absorption, self-phase modulation, stimulated Raman amplification and four wave mixing in silicon waveguides. The award also recognizes Prof Tsang’s contributions in Advanced Waveguide Grating Couplers which enable efficient coupling of light to the sub-micron sized silicon waveguides from optical fibers.

Prof. Hon Ki TSANG received the Bachelors of Arts (Honours) from University of Cambridge in 1987 and PhD from University of Cambridge in 1991. He joined the Chinese University of Hong Kong in 1993. He received the Vice-Chancellor’s Outstanding Researcher Award for his work on nonlinear silicon photonics in 2007, and became an Outstanding Fellow of the Faculty of Engineering in 2017. He is also a Fellow of the Optical Society (OSA) and a recipient of the Higher Education Outstanding Scientific Research Output Awards (second class) in Natural Sciences from Ministry of Education of China in 2014. He is a Professor and Associate Dean of the Faculty of Engineering of the Chinese University of Hong Kong.

The IEEE is the world’s leading professional association for advancing technology for humanity. Through its 400,000 plus members in 160 countries, the association is a leading authority on a wide variety of areas ranging from aerospace systems, computers and telecommunications to biomedical engineering, electric power and consumer electronics.

Dedicated to the advancement of technology, the IEEE publishes 30 percent of the world’s literature in the electrical and electronics engineering and computer science fields, and has developed more than 1300 active industry standards. The association also sponsors or co-sponsors nearly 1700 international technical conferences each year. If you would like to learn more about IEEE or the IEEE Fellow Program, please visit www.ieee.org.

Congratulations!

Prof. XU, Jianbin from the Department of Electronic Engineering, The Chinese University of Hong Kong (CUHK), has been elevated to Fellow Grade of the Institute of Electrical and Electronics Engineers (IEEE) since 2018. He is being recognized for his contributions to nanoscale electronic materials and devices.

The IEEE Grade of Fellow is conferred by the IEEE Board of Directors upon a person with an outstanding record of accomplishments in any of the IEEE fields of interest. The total number selected in any one year cannot exceed one-tenth of one-percent of the total voting membership. IEEE Fellow is the highest grade of membership and is highly recognized by the technical community as a prestigious honor and an important career achievement.

Prof. Xu is well known for his significant contributions to nanoscale characterization and nanomaterials, and more recently, nanoscale devices. In span of his entire research career he has been engaged in a number of challenging issues, namely exploring the heat transfer across a vacuum and an air gap down to submicron range which has significant implications on heat transfer in electron devices; finding the monoatomic step resolution by commercially-available atomic force microscopy (AFM) which opens up the field of AFM-based crystallography and AFM metrology, resulting in AFM being a routing characterization technique for surface inspection and precision engineering of a variety of disparate samples in academia and industry; understanding the electronic properties of ultrathin gate oxides for MOS transistors which are building blocks of the contemporary information and communications technology (ICT); developing an interface engineering strategy for graphene and two-dimensional semiconductors as well as organic semiconductors which hold a great potential for flexible electronics; just to name a few. The core of these apparently dissimilar developments is nanoscale adventure. This provides us with enormous unprecedented opportunities, as predicted by Prof. Richard P. Feynman — Nobel Laureate in 1965, saying that “There is Plenty of Room at the Bottom” in 1959.

Prof. Xu’s contributions have high impacts in nanotechnology and electron devices. He has published c.a. 400 peer-reviewed technical papers. He has over 7450 citations in Google Scholar, c.a. 5700 peer citations in Web of Science, as well as a myriad of citations by technical reviews, monographs, handbooks, and patents; among which 8 papers are classified as Highly-Cited Papers by Essential Science Indicators (the top 1% of the academic field of science and engineering). He has received twice the prestigious Young Distinguished Scholar Award (Overseas Chinese) by National Science Foundation of China (NSFC), and is a recipient of Chang Jiang Scholar Chair Professor by Ministry of Education (MoE) in 2014, a recipient of Research Excellence Award and Vice Chancellor’s Outstanding Fellow by CUHK. Meanwhile he is a prolific mentor: More than fifteen of his former students/postdocs now become faculty members or senior scientific officers in the mainland major universities and Hong Kong; One is currently Senior Technical Manager at Harvard University; One received the runner-up recognition of the Hong Kong Young Scientist Awards, a prestigious recognition among the tertiary institutions, and the Best PhD Thesis Award by Faculty of Engineering, CUHK. Four former team members have been selected as recipients of “National Thousand Youth Talents Program” (青年千人計劃), a nationwide highly competitive recruitment program.