Electronic Engineering Department, The Chinese University of Hong Kong - Prof. J.B. Xu


A significant citation of a pioneering paper by an EE team
One of early Applied Physics Letter papers by an EE team on semiconductor surface morphology by AFM (C. C. Hsu, Y. C. Lu, J. B. Xu, I. Wilson, Appl. Phys. Lett. 64, 1959 (1994).) has been cited by a Science paper (2006) from an IBM research group on silicon. The journal is very prestigious in science and technology community. The EE's team work has drawn global attention after its publication. Since then AFM has been widely used for surface quality test in various sectors of information technology industry.