Objective
This course covers the design of analog integrated circuits using modern CMOS technology. Extensive circuit simulations will be made using Cadence/SPECTRE in the homework problems and the course project. Contents include: Review of fundamentals; analog circuit building blocks: operational amplifier, comparator, voltage and current references; switched-capacitor circuits; current mode circuits; continuous-time filters; A/D and D/A converters: parallel, serial, algorithmic and over-sampling converters.

Syllabus
After finishing this course, students are expected to

• Be able to analyze and design CMOS analog IC building blocks, like operational transconductance amplifiers and comparators.
• Be able to analyze, design and characterize basic CMOS data converters of different type, including flash, successive approximation, pipeline, and oversampling types.

Learning Outcome
We will be using intensive computer simulations in the homework. Matlab is used to design and verify the system performance.

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Objective
Electrical measurements and capacitance methods. X-ray diffraction; electron paramagnetic resonance; microscopy: optical, SEM, TEM, STM and related techniques. Surface analysis techniques: AES, XPS, SIMS, RBS, ion channelling. Optical methods: ellipsometry, photoluminescence, Raman spectroscopy.

Syllabus

Learning Outcome

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Objective
This course covers principles and practice of state-of-the-art nanofabrication technology. These nanofabrication techniques are the foundation to build integrated devices and circuits with feature size below 100 nm and are widely employed in various areas such as nanoelectronics, nanophotonics, nanomechanics, and microfluidics. Students will learn to use the fabrication and characterization equipment available in the public cleanroom of the faculty of engineering. The top-down nanofabrication processes, such as lithography, etching, and thin-film deposition, etc. will be addressed.

Syllabus
This course covers principles and practice of state-of-the-art nanofabrication technology. These nanofabrication techniques are the foundation to build integrated devices and circuits with feature size below 100 nm and are widely employed in various areas such as nanoelectronics, nanophotonics, nanomechanics, and microfluidics. Students will learn to use the fabrication and characterization equipment available in the public cleanroom of the faculty of engineering. The top-down nanofabrication processes, such as lithography, etching, and thin-film deposition, etc. will be addressed.

Learning Outcome
By the end of the course, students should be able to: - understand the fundamental principles of nanofabrication approaches - design the fabrication process according to the nanodevices’ applications – photonics, electronics, or MEMS/NEMS - operate equipment to complete major top-down fabrication steps, such as lithography, etching, and thin-film deposition

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Objective
This is an introductory graduate level course on advanced fiber lasers. It will describe the theoretical principles and modelling of different types of fiber lasers including both passively and actively mode-locked fiber lasers, high power fiber lasers, supercontinuum generation and optical frequency comb generation. The course will include sufficient theory of nonlinear optical phenomena and optical dispersion to enable students to understand the basic principles of parametric gain, ultrashort pulse generation and optical frequency comb generation in fiber lasers. The course will also include a discussion on advanced measurement techniques to characterize ultrashort optical pulses. The applications of different types of fiber lasers will be discussed. Recent developments and future prospects of different fiber lasers will be reviewed.

Syllabus
This is an introductory graduate level course on advanced fiber lasers. It will describe the theoretical principles and modelling of different types of fiber lasers including both passively and actively mode-locked fiber lasers, high power fiber lasers, supercontinuum generation and optical frequency comb generation. The course will include sufficient theory of nonlinear optical phenomena and optical dispersion to enable students to understand the basic principles of parametric gain, ultrashort pulse generation and optical frequency comb generation in fiber lasers. The course will also include a discussion on advanced measurement techniques to characterize ultrashort optical pulses. The applications of different types of fiber lasers will be discussed. Recent developments and future prospects of different fiber lasers will be reviewed.

Learning Outcome
By the end of this course students will have gained the following learning outcomes:

• Understand the different types of fiber lasers and their applications
• Be able to design a mode-locked optical fiber laser for femtosecond optical pulse generation
• Be able to characterize the output from an ultrafast optical fiber laser
• Know some of the most recent developments in optical fiber lasers

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